A high-frequency power supply (RF power supply) creating 13.56 MHz plasma for thin-film processing and etching, including sputtering, etching, CVD, and ion plating.
The RF-120 series includes DeviceNet, RS232C, and analog interfaces as standard. These are multi-functional powers supplies that offer performance like pattern operation, arcing cut/count functions, and recall of past data. There is also a matching network to facilitate the combination of each power supply and connected device.
功能:
Pattern operation Automatic output control based on output and time data preset in the RF power supply Up to 3 patterns with a maximum of 5 points per pattern can be set
Arcing cut
Arcing count Counts the number of times that arcing occurs, and halts output when a preset number is reached
Pulse operation (option) Pulse frequency: 100 Hz ~ 10 kHz, duty: 20 ~ 80% *A pulse-generator must be purchased separately
Synchronous operation Can be connected to other RF power supplies and operated synchronously
Slow-start / Slow down
Reflectance limit continuation control When the reflected power limiter is triggered, the elapsed time is measured and when the specified amount of time is reached, output is halted
Past data memory When an abnormality occurs, the internal data from the prior 30 seconds is output
Matching completion confirmation When the reflected power is less than the specified value, a confirmation signal is output
Arcing cut operation confirmation
Limiter operation confirmation
Incident/ Reflected power monitor output
Input power supply confirmation
RF output confirmation
Error check signal output
Various interfaces supported as standard DeviceNet, RS232C, analo