网络研讨会｜先进表面工程技术（ALD 技术）

会议邀请

ALD（原子层沉积技术）是一种基于自限制性的化学半反应将被沉积物质以单原子膜的形式一层一层的镀在物体表面的薄膜技术。与常规的化学气相沉积不同，原子层沉积将完整的化学反应分解成多个半反应，从而实现单原子层级别的薄膜控制精度。近年来，ALD 技术在粉末等非平面样品包覆中也得到较多应用，为促进交流，Forge Nano 公司邀请学界与工业界的多位专家进行为期三天的线上报告与交流会。

Forge Nano

会议时间

北京时间 2021 年 6 月 10 日-6 月 12 日

会议形式

视频录播 + 在线交流

会议日程

6 月 10 日 粉末 ALD 研讨会

6 月 11 日 先进表面工程

6 月 12 日 行业圆桌会议

会议参加方式

网站：

https://www.forgenano.com/ase

注册信息后，在北京时间 6 月 10 日当天即可在网站观看视频，并参与互动讨论（英文）。在会议后，可在视频库中观看视频回放。

部分报告嘉宾

Forge Nano

STEVE GEORGE

Steven George is a Professor in the Department of Chemistry at the University of Colorado at Boulder. He received his B.S. in Chemistry from Yale University and his Ph.D. in Chemistry from the University of California at Berkeley. Dr. George is directing a research effort focusing on atomic layer deposition (ALD), atomic layer etching (ALE) and molecular layer deposition (MLD).  This research is examining new surface chemistry, measuring thin film growth, and etching rates, and developing new applications and reactors for ALD, ALE and MLD.  Dr. George has received several awards including the John A. Thornton Memorial Award from the AVS (2017) and the ALD Innovation Award from the AVS International Conference on Atomic Layer Deposition (2013).  Dr. George is a Fellow of the AVS (2000) and the APS (1997).

Sr. Technology Analyst

Jonas Sundqvist

TECHCET

Jonas Sundqvist, Ph.D. – Sr. Technology Analyst of TECHCET— covers ALD and CVD precursors and related technologies, and is the co-chair of the Critical Materials Council (CMC) Conference. His over 20 years of work experience includes Group Leader of the Thin-Film Technologies Group at The Fraunhofer Institute for Ceramic Technologies and Systems (IKTS) and of the High-k devices group at Fraunhofer’s Center Nanoelectronic Technologies (CNT), which included 28nm node work for GLOBALFOUNDRIES Fab1. At Infineon Memory Development Centre (MDC) he developed high-k and metal nitride ALD processes, and at Qimonda he was a materials manager focused on the ALD / CVD precursors supply-chain. He is the founder of BALD Engineering, an independent blog and networking platform for ALD. He holds a Ph.D. and a M.S. in inorganic chemistry from Uppsala University, Sweden, a B.S. in electrical and electronics engineering from Lars Kagg, and nine patents.

ALD Lead Engineer

Noureddine Adjeroud

Luxembourg Institute of Science and Technology (LIST)

Noureddine Adjeroud works in Luxembourg Institute of Science and Technology (LIST) as Laboratory Manager. He has deep expertise in the fields of vapour deposition techniques and in ALD. He worked with major semiconductor factories such as Intel, IBM, SAMSUNG. He has been LIST Lead engineer since 2015 and is the Engineer in Charge of the ALD Centre of Expertise. In 2020 Noureddine Adjeroud joined the program committee for the 2021 edition of the AVS-ALD international conference.

Research Scientist

Kathrine Hurst

National Renewable Energy Laboratory (NREL)

Katherine Hurst is a senior scientist at the National Renewable Energy Laboratory (NREL). Her research focuses on the fundamental understanding of gas-solid interactions with the goal of creating novel materials with designed interfaces, controlled morphologies, particle sizes, and tailored ad/absorption properties. Her synthesis expertise includes materials for fuel cell and electrolysis catalysis, gas storage, photovoltaic and battery applications using ALD.