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产品描述FeaturesWafer/substrate size from pieces up to 200 mm/8’’Top-side and bottom-side alignment capabilityHigh-precision alignment stageAutomated wedge compensation sequenceMotorized and recipe-controlled exposure gapSupports the latest UV-LED technologyMinimized system footprint and facility requirementsStep-by-step process guidanceRemote tech supportMulti-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)Agile processing and conversion re-toolingTable top or stand-alone version with anti-vibration granite tableAdditional capabilities:Bond alignmentIR alignmentNanoimprint lithography (NIL)Technical DataAlignment modesTop side alignment: ≤ ± 0,5 µmBottom side aligment: ≤ ± 2,0 µmIR alignment: ≤ ± 2,0 µm/ substrate material dependingBond alignment: ≤ ± 2,0 µmNIL alignment: ≤ ± 2,0 µmExposure sourceMercury light source / UV LED light sourceWedge compensationFully automatic - SW controlledWafer diameter (substrate size)Up to 100 / 150 / 200 mmExposure setupVacuum contact / hard contact / soft contact / proximity modeExposure optionsInterval exposure / flood exposure / sector exposureAdvanced alignment featuresManual alignment / in-situ alignment verificationManual cross correctionLarge gap alignmentSystem controlOperation system: WindowsFile sharing & back-up solution / unlimited no. recipes & parametersMulti-language user GUI & support: CN, DE, FR, IT, JP, KRReal-time remote access, diagnostics & troubleshootingNanoimprint lithography technologyUV-NIL
Features
Wafer/substrate size from pieces up to 200 mm/8’’
Top-side and bottom-side alignment capability
High-precision alignment stage
Automated wedge compensation sequence
Motorized and recipe-controlled exposure gap
Supports the latest UV-LED technology
Minimized system footprint and facility requirements
Step-by-step process guidance
Remote tech support
Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
Agile processing and conversion re-tooling
Table top or stand-alone version with anti-vibration granite table
Additional capabilities:
Bond alignment
IR alignment
Nanoimprint lithography (NIL)
Technical Data
接触式双面光刻机 EVG®610,EVG®610
接触式双面光刻机 EVG®610信息由上海螣芯电子科技有限公司为您提供,如您想了解更多关于 接触式双面光刻机 EVG®610报价、型号、参数等信息,欢迎来电或留言咨询。
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