GL纳米压印机 GL4/6 ，GL6/8/12

产品描述

GL4/6 R&D

Multi-functional NIL machine for R&D

➢Multi-function NIL machine for R&D and small

volume production

➢Easy switch between different NIL configurations,

flxibilities for R&D

➢Functions: High resolution NIL on spin-coated

substrates, Puddle dispensed NIL for Micro

molding processes, NIL on curved or spherical

surfaces

GL6/8/12 CLIV

High resolution NIL machine for mass production

➢NIL machine equipped with GermanLitho patented

CILV technology for mass production

➢NIL on spin-coated substrates for high resolution

and high aspect ratio nanostructures

➢Automatic working stamp replication, imprinting

and demolding processes, excelent imprint

uniformity over large area

➢Better than 40nm resolution, 10:1 aspectration,

20nm residual layer thickness

GL8 MLA

NIL machine for microlens array production

➢Mass production NIL machine for micro-molding of

microlens array or diffuser processes

➢Automatic working stamp replication, imprinting

and demolding processes, resist dispense

integrated

➢Active control of gap and parallelism between

stamp and substrate, excelent TTV

➢Alignment for wafer stacking processes

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