The ETD-2000III type three target ion sputtering apparatus is the simplest, reliable and economical coating equipment designed on the basis of DC (DC) sputtering principle. This machine is specially designed to install three targets in a vacuum chamber. The rotating sample stage can be coated with three materials on the same sample in turn. Therefore, it is suitable for the preparation of various composite membrane samples and the fabrication of experimental electrodes for non conductor materials.
It is easy to control the vacuum chamber pressure, ionization current and choose the required ionization gas when working in conjunction with the internal automatic control circuit, so as to achieve the best coating effect.
High qualitative jump vacuum pump