伯英科技粉末与颗粒镀膜原子层沉积系统-Powder ALD-研发与生产型

Name: 伯英科技粉末与颗粒镀膜原子层沉积系统-Powder ALD-研发与生产型
Brand: 伯英
SKU: Powder ALD-

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参考价：面议

品牌：伯英产地：北京型号：Powder ALD- 样本：点我免费下载样本

北京伯英科技有限公司

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产品介绍

粉末原子层沉积系统 ALD

美国ALD NANOSOLUTIONS公司技术，专注于粉末颗粒表面镀膜。

专用于在粉末、颗粒表面沉积ALD薄膜，可用于科研，生产。单批次体积从45ml~150L，满足科研到生产的需要。可沉积氧化物，氮化物，金属等类型薄膜。可用于锂离子电池、催化剂、等需要粉末镀膜的行业。

专业的粉末镀膜原子层沉积系统，为科研与生产提供专业的解决方案。

设备沉积方法有：流化床法、滚动法、振动法。

粉末原子层沉积系统型号:

FX系列：75 or 150 mL，适用于R&D

FP系列: 500 mL / 2 L / 5 L / 10 L，适用于R&D，生产

RX系列：10 or 40 mL，适用于R&D

RP系列： ~40L, 适用于生产

CVR系列：15L/hr to 150L/hr，适用于生产

粉末原子层沉积系统技术参数：

ALD REACTOR SYSTEMS	Fluidized Bed Reactors (FBR)	Rotary Reactors (Rotary)	Continuous Vibrating Reactors (CVR)
Substrate Volume	75mL to 10L per batch	10ml to 40L	15L/hr to 150L/hr
Substrate Mass (Density Dependent)	75g - 12.5kg per batch	10g - 50kg per batch	15kg/hr to 150kg/hr
Vapor Draw Sources	2 standard, up to 8	2 standard, up to 8	2 standard, up to 8
Regulatory Compliance	CE, GMP and ISO compliance upon request
Weight	300 lbs - 1,000 lbs (150kg - 500kg)	300lbs - 4,000lb (150kg - 2000kg)	500lbs - 8,000lb (250kg - 4000kg)
Venting Emissions and Abatement	Equipment can be designed to comply with local jurisdiction codes and regulations
Electrical Requirements	Project-specific and customized. Further details can be supplied upon request
Demonstrated Particle Diameters	10 nm - 500micron	10 nm - 200micron	5-50micron
Potential Particle Diameters	2 nm - 1mm	2 nm - 250px	10nm - 1 cm
Other Features	Highest Precursor Efficiency	Plasma ALD Compatible	Atmospheric Pressure Operation

Fluidization Reactor – Experimental Series (FX)

Reactor Style:	Fluidization Reactor
Substrate Volume:	75 or 150 mL
Reactor Temperatures Range:	25 – 450 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 4
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	300 lbs/ 140 kg
Options Available:	Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Glovebox Research License for ALD on Particles Various Vapor Sources

Reactor Style:	Fluidization Reactor
Substrate Volume:	500 mL / 2 L / 5 L / 10 L
Reactor Temperatures Range:	25 – 450 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 8
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	400 lbs/ 180 kg
Options Available:	Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Research License for ALD on Particles Various Vapor Sources

Reactor Style:	Rotary Reactor
Substrate Volume:	~40 L
Reactor Temperatures Range:	25 – 200 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 8
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	500 lbs/ 230 kg
Options Available:	Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources

Reactor Style:	Rotary Reactor
Substrate Volume:	10 or 40 mL
Reactor Temperatures Range:	25 – 200 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 8
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	300 lbs/ 140 kg
Options Available:	Substrate Loading Plasma Source from Meaglow Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources