Special Features

• Stand-alone turn-key combinatorial PLD System

• Continuous Composition Spreads of binary/ternary/quaternary phase spreads

• No post anneal and no masks

• Film growth under ‘true’ deposition conditions (such as 800˚C, 500 mTorr)

• Wafer size: 2” diameter is standard (with 4” and 6” custom designs)

• Deposition of epitaxial films, multi-layer heterostructures and superlattices

• Oxygen compatibility for oxide film depositions at high temperatures

Overview

The ability to produce many different material compositions in a single deposition run greatly accelerates the time to arrive at an optimum composition having the desired material properties. Continuous Composition Spread PLD (CCS-PLD) is based on the deposition rate profiles naturally occurring in PLD as a result of the Cosn (θ) (5 ≤ n ≤ 11) dependence. PLD-CCS benefits from the proven ease of multi-layer depositions using Neocera software and the intrinsic forward-directed nature of the PLD process to vary the composition of a binary/ternary/quaternary phase spread. PLD-CCS varies the material in an analog scheme, rather than in discrete elements, thus eliminating the need for masks. This allows for a very rapid successive deposition of each constituent at a rate of much less than a mono-layer per cycle, resulting in an approach that is fundamentally equivalent to a co-deposition method. The fact that this method does not depend on a post-deposition anneal to promote inter-diffusion or crystallization makes it applicable to studies where growth temperature is a critical parameter, or to situations where high-temperature anneals are incompatible with either the deposited material or the substrate. As no masks are used, this technique can operate in a wide dynamic range of pressures (up to about 500 mTorr) which are typically not possible in a mask-based approach. Neocera PLD systems can provide both combinatorial PLD (CCS-PLD) and standard PLD capabilities within the same system.

Neocera 脉冲激光沉积系统Combinatorial Pulsed Laser Deposition System应用,Neocera 脉冲激光沉积系统Combinatorial Pulsed Laser Deposition System报价,Neocera 脉冲激光沉积系统Combinatorial Pulsed Laser Deposition System参数,激光脉冲沉积(PLD)报价,

Neocera 脉冲激光沉积系统Combinatorial Pulsed Laser Deposition System信息由北京正通远恒科技有限公司为您提供，如您想了解更多关于Neocera 脉冲激光沉积系统Combinatorial Pulsed Laser Deposition System报价、型号、参数等信息，欢迎来电或留言咨询。