表征玻璃基底上的ZrO2薄膜

领域：电子/电器/半导体    样品：ZrO2薄膜    项目：膜厚度，光学常数，组成   

The deposition method and conditions used for preparation of the ZrO films have resulted in generation of an inhomogeneous porous layer. Owing to the sensitivity of the UVISEL Spectroscopic Phase Modulated Ellipsometer and software it is possible to detect this layer, and to characterise its composition while at the same time measuring the film thicknesses and optical constants.